Document Type
Proposal
Publication Date
1-1-2015
College
College of Engineering
Department
Chemical and Materials Engineering
Recommended Citation
Lei, Yu, ""Atomic Layer Deposition (ALD) is a Thin Film Deposition Technique Widely Used in Microelectric Industry, Including IBM, Intel, SamSung, etc." (2015). Summer Community of Scholars (RCEU and HCR) Project Proposals. 347.
https://louis.uah.edu/rceu-proposals/347
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